1

Low temperature crystallization of amorphous silicon films

Year:
1979
Language:
english
File:
PDF, 84 KB
english, 1979
5

Edge leakage of cobalt silicided shallow junctions

Year:
1997
Language:
english
File:
PDF, 316 KB
english, 1997
9

Backscattering analysis of impurities in the ion beams

Year:
1978
Language:
english
File:
PDF, 244 KB
english, 1978
19

Early growth of thin films deposited by ion-beam sputtering

Year:
1977
Language:
english
File:
PDF, 6.71 MB
english, 1977
21

Etch rate enhancement of silicon in CF4-O2 plasmas

Year:
1985
Language:
english
File:
PDF, 521 KB
english, 1985
30

Reaction of Amorphous Silicon with Cobalt and Nickel Silicides Before Disilicide Formation

Year:
1995
Language:
english
File:
PDF, 292 KB
english, 1995
37

X-Ray Techniques for Silicides

Year:
2001
Language:
english
File:
PDF, 636 KB
english, 2001
39

Anisotropic Dry Etching of Aluminum Films Deposited on Topographic Steps

Year:
1986
Language:
english
File:
PDF, 645 KB
english, 1986
40

Relaxation of Strained SiGe on Insulator by Direct Wafer Bonding

Year:
2004
Language:
english
File:
PDF, 151 KB
english, 2004